Journal of Vacuum Science & Technology A Vacuum Surfaces and Films· 2012Q2

High power impulse magnetron sputtering discharge

Jón Tómas Guðmundsson, N. Brenning, Daniel Lundin, Ulf Helmersson

745citations
Q2SCImago
2012year

Short summary

High Power Impulse Magnetron Sputtering (HiPIMS) achieves high plasma density and sputtered vapor ionization, enabling better film growth control compared to conventional sputtering.

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Field: Mechanics of Materials

Mechanics of MaterialsEngineering