Advanced Optical Materials· 2026Q1
Extrinsic Limitations of Stealthy Hyperuniform Devices
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- 2026year
Short summary
Stealthy hyperuniform metasurfaces show reduced elastic scattering but less than predicted, with fabrication defects identified as the primary cause.
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Key points
- Stealthy hyperuniform metasurfaces experimentally demonstrate reduced elastic scattering at optical frequencies.
- Measured scattering suppression is substantially weaker than theoretical predictions based on ideal patterns.
- Fabrication imperfections, not inherent hyperuniformity limits, are identified as the dominant cause for reduced performance.
- The study quantifies these extrinsic limitations, providing practical design guidelines.
AI-generated from the title and abstract; the full text is not read.
Abstract
ABSTRACT Hyperuniformity promises an unusual form of wave control: the suppression of elastic scattering over extended angular ranges without periodic order. Here, we present a comprehensive experimental and theoretical study of 2D stealthy hyperuniform metasurfaces operating at optical frequencies. In agreement with theoretical expectations, we observe a pronounced reduction of elastic scattering around the specular direction in metasurfaces fabricated by electron‐beam lithography. However, the measured suppression is substantially weaker than that predicted by structure‐factor calculations based on ideal stealthy hyperuniform point‐pattern generators. We identify and quantitatively analyze the physical origins of this discrepancy and establish realistic performance bounds. By isolating the dominant limiting mechanisms, our results provide practical design guidelines for the implementation of stealthy hyperuniformity in functional devices.
The authors' abstract, as published at the source. Advanced Optical Materials, 2026 · DOI ↗
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Field: Electronic, Optical and Magnetic Materials
Electronic, Optical and Magnetic MaterialsMaterials Science