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Journal of Non-Crystalline Solids· 2026Q2

Molecular dynamics study of high-temperature creep in carbon-rich amorphous silicon carbide: The role of local coordination

Kang Guan, Yi Wang, Ming Lv, Cheng Peng et al.

Short summary

Molecular dynamics simulations reveal that high-temperature creep in carbon-rich amorphous silicon carbide (a-SiC) is driven by the preferential occupation of under-coordinated, high-free-volume sites by carbon atoms, rather than an intrinsic chemical property.

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Key points

  • High-temperature creep in carbon-rich a-SiC is topology-driven, not chemically driven.
  • Viscoplastic flow is governed by carbon atoms occupying under-coordinated, high-free-volume sites.
  • These sites act as nucleation points for stress-activated atomic rearrangements.
  • The amorphous network accommodates strain while maintaining global connectivity.

AI-generated from the title and abstract; the full text is not read.

Abstract

The high-temperature creep resistance of polymer-derived carbon-rich amorphous silicon carbide (a-SiC) is critical for its application in extreme environments; however, the atomistic origins of its viscoplastic flow remain debated. In this study, molecular dynamics simulations combined with a coordination-resolved non-affine displacement ( D min 2 ) framework are used to investigate the structural mechanisms governing primary creep in a-SiC. By decoupling the effects of chemical identity and local network topology, we show that the apparent “hyper-mobility” of excess carbon is not an intrinsic chemical characteristic. Instead, viscoplastic flow is primarily topology-driven and governed by the preferential occupation of under-coordinated, high-free-volume sites by carbon atoms. These localized structural defects serve as nucleation sites for stress-activated atomic rearrangements, enabling the amorphous network to accommodate sustained viscoplastic strain while maintaining global connectivity. On the basis of these findings, we propose that future material optimization should shift from conventional macroscopic stoichiometric tuning toward “topological engineering.” Passivation of under-coordinated defects through thermomechanical densification, selective heteroatom cross-linking, or nanoscale interface pinning offers a targeted strategy for designing highly creep-resistant disordered covalent networks.

The authors' abstract, as published at the source. Journal of Non-Crystalline Solids, 2026 · DOI ↗

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Field: Electrical and Electronic Engineering

Electrical and Electronic EngineeringEngineering