Journal of Materials Science· 2026Q1
Hydrothermally assisted sintering of calcium hydroxide sputtering targets: a route to quantum-grade CaO thin films
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- Q1SCImago
- 2026year
Short summary
Dense polycrystalline calcium hydroxide ceramics, achieving up to 98% relative density, were fabricated via hydrothermally assisted sintering (cold sintering) at 100-300°C and 400 MPa, preserving the brucite phase and enabling epitaxial CaO thin film deposition.
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Key points
- Dense calcium hydroxide ceramics (up to 98% relative density) produced by cold sintering at 100-300°C and 400 MPa.
- Brucite phase preserved, with minimal additional calcium carbonate formation during sintering.
- Microstructure evolution suggests mass transport and plastic deformation as densification mechanisms.
- Scaled-up 2-inch diameter targets used for epitaxial CaO thin film deposition on r-plane sapphire.
- Epitaxial (002)-oriented CaO films deposited at a stable rate of 1.2 nm/min.
AI-generated from the title and abstract; the full text is not read.
Abstract
Abstract In this report, we demonstrate dense polycrystalline calcium hydroxide ceramics fabricated by hydrothermally assisted sintering—often referred to as cold sintering—to produce high-purity calcium hydroxide targets for calcium oxide thin film deposition. Calcium hydroxide ceramics exhibit up to 98% relative density without thermal dehydration when sintered at temperatures between 100 and 300 °C with 400 MPa applied uniaxial pressure for 1 hour. The brucite phase is preserved in calcium hydroxide targets sintered at all temperatures. Small equivalent fractions of calcium carbonate are present in both the calcium hydroxide precursor powder and final targets suggesting minimal additional carbonate production during formation and densification. Microstructure evolution during densification is documented by scanning electron microscopy (SEM), indicating both mass transport and plastic deformation densification mechanisms. The hydrothermal-assisted sintering process is scaled up to produce 2-inch-diameter calcium hydroxide targets suitable for sputter deposition. We also report epitaxial calcium oxide film deposition from these targets on r -plane sapphire substrates. (002)-oriented epitaxial films are achieved with a time-stable deposition rate of 1.2 nm per minute. We note that energetic bombardment during growth can be substantial, necessitating an off-axis sputter cathode geometry.
The authors' abstract, as published at the source. Journal of Materials Science, 2026 · DOI ↗
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Field: Ceramics and Composites
Ceramics and CompositesMaterials Science